Vacuum Coaters

1- PDC-32G Compact Desktop Plasma Cleaner


EQ-PDC-32Compact Desktop Plasma Cleaner Gis a micro desktop plasma cleaner, this machine can use air, oxygen, Ar to clean the nano organic pollutants on the surface of glass, semiconductor, high polymer material, metal substrate. In the condition of the high (RF) power, the max organic cleaning rate is about 10nm/min. Before you coat the material, use the machine to clean the single crystal substrate for reaching the better effect.


Small and beautiful shape 

Adjustable RF power: (high, medium, low)

Safe operation, low cost, environmental

input voltage: 115V AC ,50/60 Hz or230V AC, 50/60 Hz, 200W

Output frequency:13.56 MHz

Plasma jet frequency: output power is adjustable at three levels:

low 680V DC 10mA DC 6.8W 

medium 700V DC 15mA DC 10.5W

high 720V DC 25mA DC 18 W

Plasma chamber body: 76mm(Dia.)x 165mm(Length) 

Pyrex glass chamber body, Detachable front cover

Vacuum pump and control valve: dipolar sliding vane rotary vacuum

pump(110V, 226 L/m) with filter and KF-D25 Lock gate----equip with KFD25 connecter , 600mm stainless steel tube and high quality filter.

Max. ultimate pressure is 30 m Torr less

1/8" NPT needle valve effective control the gas flow and the pressure in the chamber.

1/8" NPT threeway valve is in order to spread the gas and to exchange the chamber isolating and air leakage conditions.

Inert gas:According to the required washing pollutant, we can select to use N2, Ar, Air and mixed gas.

Note: can't use flammable gas

Warranty: One year (without Pyrex glass chamber body)

If use the 2" crystal quartz boat, this cleaner can treat 25 of dia.2"crystal one time

Digital vacuum gauge: used for precision regulating and controlling the

pressure in the chamber.


2- GSL-1100X-SPC16C Sputtering Evaporate Carbon Instrument


GSL1100X-SPC16C Sputtering Evaporate Carbon Instrument is a CE certified machine, can be used for plasma sputtering coating film and

evaporate carbon coating film. It can not only be used for plasma sputtering coating the metal film, and can obtain the carbon thin film through the evaporating. GSL1100X-SPC16C is designed basic on dipolar (DC)sputtering principle, it's a sample, reliable, low cost coating equipment. Add a heating evaporate attachment at the same time, have two functions of sputtering and evaporating. Suit for manufacture scanning electron microscope (SEM) sample in the laboratory, also can make the nonconductor material testing electrode.


GSL1100X-SPC16C can research the performance various new materials. GSL1100X-SPC16C accessories is based on GSL-1100X-SPC-16. Add a heating evaporate attachment at the same time, have two functions of sputtering and evaporating. Therefore, to expand the application, especially for manufacturing the scanning electron microscope laboratory sample


1. Vacuum sample room: Pyrex glass 160mm°¡110mm (D°¡H)

2. Target (upper electrode): 50mm°¡0.1mm (D°¡H)

3. Sample holder: 50mm(D)

4. Vacuum operation: 4°¡10-1mbar to 2°¡10-2mbar

5. Working voltage: 0-1600V (DC) adjustable

6. Sputtering current: 0-50mA

7. Sputtering timer: 1-9999S

8. Evaporate carbon current: 0-10A(AC)

9. Vacuum pump: 4L two-step mechanical rotary pump

(Ultimate vacuum 2°¡10-2mbar)


3- GSL-1100X-SPC-16M Magnetic Control Sputtering Coater


GSL-1100X-SPC-16M Magnetic Control Sputtering Coater is designed basic on dipolar (DC)sputtering principle, it's a sample, reliable, low cost coating equipment. Suit for manufacture scanning electron microscope (SEM) sample in the laboratory, also can make the nonconductor material testing electrode


1. Sample sputtering chamber vacuum gauge and sputtering ampere meter, to indicate and monitor instrument's condition

2. Sputtering current adjustable controller, micro vacuum gas valve. When working combine with the internal automatic control circuit can easily control the pressure in the vacuum chamber, ionization current and arbitrary select the required ionized gas, to obtain the best coating effect.

3. Particular designed bell edge rubber seal ring, can make sure to have a long term usage and can't appear the "brokenedge"phenomenon to effect the sample sputtering chamber vacuum degree

4. Ceramic seal high pressure head is more durable than the rubber seal.

5. According to gas ionization character in the electric field, using the high capacity sample sputtering chamber and corresponding area sputtering target, to make the coating film more uniform and pure.


1. This system equips with magnetic control target, Dia. target surface : 50 mm, can fast change the target's materials. sputtering head is cooling by Peltier, can obtain the high-performance and precision granule coating film (without water cooling)

2. Can select water-cooling sputtering head and water-cooling sample holder platform.

3. Main machine size: L360mm*W300mm*H380mm

4. Target(upper electrode): gold: diameter: 50mm, Thickness: 0.1mm

5. Vacuum specimen chamber: Diameter: 160mm, Height: 120mm

6. Sputtering area: ?50mm

7. Indicating gauge: Max. vacuum degree???4X10-2 mbar

8. Son ammeter: Max. current: 50mA(100mA)

9. Timer: Max. time: 9999S

10. Mini vacuum air valve: can contact with ?3mm tube

11. Allowed gas: Various

12. Max. voltage: -1600 DCV

13. Mechanical pump: 2L/S


4- GSL-1100X-SPC16-3 3 Targets Plasma Sputtering Coater


GSL1100X-SPC16-3 3 Targets Plasma Sputtering Coater is a CE certified compact plasma sputtering coater. This machine is basic on dipolar (DC) sputtering principle designed, it's a sample, reliable, low cost coating equipment. It's special because it has 3 targets in the vacuum chamber.

Rotary sample board, can coating three kinds of materials on the same

sample in turn. Suit for manufacture all kinds of complex film sample in the laboratory, also can make the non-conductor material testing electrode


1. Sample sputtering chamber vacuum gauge and sputtering ampere meter, to indicate and monitor instrument condition

2. Sputtering current adjustable controller, micro vacuum gas valve.

When working combine with the internal automatic control circuit can easily control the pressure in the vacuum chamber, ionization current and arbitrary select the required ionized gas, to obtain the best coating effect.

3. Particular designed bell edge rubber seal ring, can make sure to have a long term usage and can't appear the "brokenedge"phenomenon to effect the sample sputtering chamber vacuum degree??

4. Ceramic seal high pressure head is more durable than the rubber seal.

5. According to gas ionization character in the electric field, using the high capacity sample sputtering chamber and corresponding area sputtering target, to make the coating film more uniform and pure.


1. Target(upper electrode): Diameter: 45mm, Thickness: 0.12mm

2. Vacuum specimen chamber: Diameter:160mm, Height: 120mm

3. Sputtering area: ?45mm, three areas

4. Vacuum gauge: Max. vacuum degree: ?4X10-2 mbar

5. Plasma ampere meter: Max. current: 50mA

6. Timer: Longest time: 900S

7. Compact vacuum valve: can connect with?3mm flexible tube

8. Allowed gas: all kinds

9. Max. voltage: -1600 (-3000) DCV

10. Mechanical pump: 2L/S


5- GSL-1100X-PJF-A Plasma Surface Treatment


GSL-1100X-PJF Plasma Surface Treatment is a compact atmosphere plasma surface treatment jet system, mainly consist of RF generator and plasma beam head. In the low temperature and no vacuum condition, the jet plasma beam can be fast to active and clean the surface of the materials. Such as: single crystal wafer, optical component, plastic and other widely materials. To obtain the high quality epitaxial film or optical coating, the advanced surface treatment can reach the obvious effect


1. Easy to operate, safe, high speed to treat the objects' surface

2. Don't need vacuum and chamber

3. Small and practical, low cost

4. Light weight, compact structure.

5 Warranty and certification, One year, CE certified

1. Input power supply: 110/220,50/60Hz, less than 1000W;

2. Output frequency: 20-23KHz;

3. Ion beam: Include 2ion beam, round head 10-12mm,rectangle head15-18mm;

4.Input gas pressure and working atmosphere??Min 0.275MPa??working gas atmosphere can be air, N2, Ar, mixed gas??can't use flammable and explosive gas)

5. Plasma working pressure: 0.048MPa-0.068MPa

6. Working environment: temp< 42°C; Humidity? 40%RH; Without flammable gas

7. Automatic control 3D working platform (X/Y-axis electrical control, Z-axis Manual adjustable)

8. Working platform dimension: Ø100mm vacuum pump

9. Working platform X-axis travel distance??200mm, Y-axis travel

distance:100mm

10. Nozzle adjustable height: 50mm